HYW Series
Market
Semiconductor/Flat panel Display/Photovoltaic
Measurement Fluid
Process Gas/High Purity Gas/Special high pressure Gas
Application
Cylinder Cabinet /Valve Manifold Box/Gas Panel/ Vaporizer
Water Process(Front End)
Diffusion/CVD/Etching
Features & Benefits
- HASTELLOY diaphragm applied
- ATF(Advanced Thick Film) Technology-a Proprietary
- Temperature stability improvement by advanced technology
- Compact design
- Local Zero Adjustment
- CE Mark / RoHS compliant
Specifications
Features | Thick Film / Strain Gauge / “Dry”=Fluid Less | ||
Application | Any Gases compatible with SS316L and Hastelloy | ||
Pressure Range | Zero point | 0MPa or -0.1MPa | |
Full scale | 0.5MPa,1MPa,2MPa,3.5MPa,7MPa,20MPa | ||
Proof Pressure | 2×F.S. ; 1.5×F.S ( > 20MPa) | ||
Output | 4 to 20mA | ||
Operating Temperature | 0 to 80℃ | ||
Compensated Temperature | 0 to 60℃ | ||
Compensated Effect | ±0.05%F.S/℃(std 25℃) | ||
Accuracy(include L.H.R)*1 | ±0.3%F.S. | ||
Materials | Materials exposed to gases | SS316L | |
Diaphragm | Hastelloy C-22 | ||
Sensor Case | SS304 | ||
Seal Method | Ultra Precision Electron Beam Welding | ||
Leak Integrity | <5×10-12Pa・m3/sec | ||
Surface Finish | EP treated Ra:<0.25µm | ||
Internal Volume SMV , TMV | (SMV)0.67cm3 , (TMV) 1.25cm3 | ||
SN(F)V , TN(F)V | (SN)0.89cm3 , (SF)0.75cm3 , (TN(F)) 1.59cm3 | ||
Power Supply | DC24V±10% | ||
Response Speed | Less than 2ms | ||
Remark | CE Mark / RoHS Compliant |
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